High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

Series AK regulator was designed for general use in a wide variety of applications. The series is available in single or two stage models, with low to high flow capacities. Some AK regulator models offer a tied-diaphragm design. Available options include Hastelloy® internals for corrosion resistance, panel installation, and a variety of pressure gauges in psig/bar or MPa units.

Series AK regulator was designed for general use in a wide variety of applications. The series is available in single or two stage models, with low to high flow capacities. Some AK regulator models offer a tied-diaphragm design. Available options include Hastelloy® internals for corrosion resistance, panel installation, and a variety of pressure gauges in psig/bar or MPa units.

Series AK regulator was designed for general use in a wide variety of applications. The series is available in single or two stage models, with low to high flow capacities. Some AK regulator models offer a tied-diaphragm design. Available options include Hastelloy® internals for corrosion resistance, panel installation, and a variety of pressure gauges in psig/bar or MPa units.

Series AK regulator was designed for general use in a wide variety of applications. The series is available in single or two stage models, with low to high flow capacities. Some AK regulator models offer a tied-diaphragm design. Available options include Hastelloy® internals for corrosion resistance, panel installation, and a variety of pressure gauges in psig/bar or MPa units.

The MHSJ3 Series, 3-finger grippers adds a dust cover to protect from the work environment. These are optimal for gripping spherical, cylindrical or round work pieces and loading or unloading of work pieces from the chuck of a machine tool.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve. The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

High vacuum angle valve series XL provides excellent thermal conductivity results in a uniform temperature for the entire valve body and a marked decrease in the condensation of gases inside the valve.